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07/09/2009

What defines LDMOS Ruggedness: Obsolete VSWR Tests gives way to “Fast Times at Doherty High”

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July 9, 2009

Freescale


Leonard Pelletier-2


Leonard Pelletier is the Application Support Manager for Freescale RF in Tempe, AZ and is in charge of providing technical assistance to the amplifier design community. He has been with the company since 1995 working in this position supporting any and all RF applications. Prior to his work with RF components, Mr. Pelletier held amplifier design engineering positions with both the Motorola Cellular Infrastructure Group in Arlington Heights, IL and the Motorola RF Products Division in Torrance, CA

To comment or ask Leonard a question, use the comment link at the bottom of the entry.


In the RF LDMOS semiconductor business, everything is constantly changing.  The applications change, the device requirements change, the customer’s expectations change and of course, the competition changes.

 

The latest applications change in the LDMOS market space is one of improved ruggedness and how to properly define and test the device’s new ruggedness criteria.  In the ancient chronicles of past LDMOS history, we always talked about the standard universal test of applying a constant input CW test signal, of a high power level and maybe even an elevated VDD, then operating the device into a relatively nasty, high VSWR load test condition at all load phase angles to see if we could cause an electrical overstress event and damage the parts.

 

The all phase angle requirement was there to insure that the parts experienced both the high current stress of a low impedance load and the high voltage swings of a high impedance VSWR event.  High current would stress the thermal design and high voltage would stress the voltage breakdown limits.

 

The problem was that this VSWR test did not really match the ruggedness requirements of the field applications.  Yes, they simulated open circuit cables or ice covered antennas, but with modern LDMOS devices, the typical worst case range of these tests were of such a low stress level that they did not produce any failures in the course of normal operation.

 

With the new Doherty applications, we were starting to see occasional failures in the peaking amp device side, even though that device, in theory, had the lesser stress of the two sides, as defined by the standard VSWR criteria.  It turned out that those devices were failing not due to thermal or standard, steady state DC voltage breakdown issues, but due to dV/dT induced snapback failures due to the rapidly changing nature of the peaking signal.

 

Investigations into the fast rise time snapback ratings of the various generations of LDMOS showed that there was very poor correlation between VSWR ruggedness and snapback ruggedness ratings.

 

Fortunately, we were able to change some of the internal design optimizations of our latest LDMOS structures and significantly improve their snapback ratings, both in a peak voltage level and in a peak current-to-failure rating.

 

So we will end this blog with a new rule of thumb for dV/dT induced snapback ruggedness ratings:

 

All 50V and 900 MHz HV8 devices are good for pulse rise times as short as 10 nSec.  All other devices are limited to greater than 100 nSec.

 

This rule will change as more devices are rolled out in the future, but for the next 6 months, this will remain a valid assumption…

 

RF Leonard - follow me at www.twitter.com/RFLeonard

05/26/2009

Innovate or Die: Next Gen LDMOS Process Improvements

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May 26, 2009

Freescale


Leonard Pelletier-2


Leonard Pelletier is the Application Support Manager for Freescale RF in Tempe, AZ and is in charge of providing technical assistance to the amplifier design community. He has been with the company since 1995 working in this position supporting any and all RF applications. Prior to his work with RF components, Mr. Pelletier held amplifier design engineering positions with both the Motorola Cellular Infrastructure Group in Arlington Heights, IL and the Motorola RF Products Division in Torrance, CA

To comment or ask Leonard a question, use the comment link at the bottom of the entry.


In the semiconductor business, everyone is constantly revitalizing their portfolio, improving on the capability of their devices to make the next generation of parts significantly better than what is available now. Run faster, jump higher, PF flyers. The semiconductor business model is “innovate or die”. Either you are moving forward and winning or you are not-so-slowly dying. Competition drives the requirement for innovations and the fastest innovators typically have the best products, broadest portfolio base and the largest market share.

LDMOS is no stranger to this innovation requirement, and given that it takes, on average, about 18 months to create a new generation product platform, then it is high time we start seeing the 8th generation (HV8) series of devices start rolling out of the factory.

HV8 is different. You may have heard this before with previous generations and in this case, it is also true. The requirement for improved efficiency is always one of the main drivers for innovation, but the way HV8 achieves this goal is different from past generations of devices. Most of the HV8 improvements came about by reconfiguring the active channel, drain extension region of the LDMOS structure. Here, by altering the doping levels and controlling the electric field intensity, we can optimize the impact ionization potential.  In this case, lower is better and lower impact ionization levels translate to a device with significantly improved ruggedness and lower hot carrier injection, which in turn reduces Vgs drift.

Ldmosmay22

This channel optimization, along with some alternative top metal changes produces a generation of devices that have a 20% higher power density, on a watts per mm basis.  A 20% improvement in power density translates to higher terminal impedances, wider bandwidth capability and 5 points higher efficiency at the P1dB compression level.

In addition to power and efficiency improvements, HV8 devices also have improved raw and DPD correctable linearity, which is the result of a 30% - 50%  reduction in AM/PM phase distortion levels compared to HV7 devices.  The efficiency and linearity improvements combine to create a device with significantly better performance in both traditional Class AB and Doherty amplifier configurations.

So it is innovate or die, and the improvements of HV8 show that LDMOS is not planning on pushing up daises anytime soon.

RF Leonard – follow me at www.twitter.com/RFLeonard
#IMS2009 - Coming up next:  A New Test for Ruggedness: Fast Rising dV/dT

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